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Characteristic of SiO Films Deposited by Using Low ...

Journal of the Korean Physical Society, Vol. 46, No. 4, April 2005, pp. 890894 Characteristic of SiO 2 Films Deposited by Using Low-Temperature PECVD withTEOS/N 2 /O 2 June HeeLee, Chang Hyun Jeong, Jong Tae Lim, Nam Gil Jo, Se Jin Kyungand Geun Young Yeom † Department of Materials Science ...

Study of the In-situ preparation of nano-SiO2/THPS ...

... 42.42.42.4 InInInInsitusitusitusitutannedtannedtannedtannedbybybybynano-SiOnano-SiOnano-SiOnano-SiO 2222 /THPC/THPC/THPC/THPCnano-compositesnano-compositesnano-compositesnano-composites Pickledsheepskinwasusedinthetanningexperiment.Inaprocedure,theconicalflask,charged withTEOS(2g),deionizedwater(10g ...